Yukio Ohkubo
Supervisor at Anritsu Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Semiconductors, Lithography, Etching, Dry etching, Magnetism, Chromium, Scanning electron microscopy, Photomasks, Helium, Plasma

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