Yukio Takabayashi
General Manager at Canon Inc.
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Polishing, Curtains, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Liquids

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Lithography, Polishing, Optical lithography, Curtains, Ultraviolet radiation, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Surface finishing

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Actuators, Lithography, Particles, Distortion, Photomasks, Semiconductor manufacturing, Source mask optimization, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | October 20, 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Actuators, Lithography, Curtains, Data modeling, Particles, Photomasks, Nanoimprint lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Semiconductors, Lithography, Curtains, Particles, Manufacturing, Image resolution, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Curtains, Dry etching, Ultraviolet radiation, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Overlay metrology, Liquids

Showing 5 of 7 publications
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