Dr. Yukiyasu Arisawa
at EUVL Infrastructure Development Ctr Inc
SPIE Involvement:
Publications (27)

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 904822 (2014) https://doi.org/10.1117/12.2046139
KEYWORDS: Semiconducting wafers, Atomic force microscopy, Data modeling, Inspection, Extreme ultraviolet lithography, Defect detection, Photomasks, 3D modeling, Geometrical optics, EUV optics

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86792S (2013) https://doi.org/10.1117/12.2011635
KEYWORDS: Photomasks, Monte Carlo methods, Surface roughness, Semiconducting wafers, Extreme ultraviolet, Lithography, 3D modeling, Extreme ultraviolet lithography, Modulation, Tolerancing

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86791X (2013) https://doi.org/10.1117/12.2011408
KEYWORDS: Semiconducting wafers, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photomasks, Image processing, Signal processing, Light, EUV optics

SPIE Journal Paper | 1 March 2013 Open Access
JM3, Vol. 12, Issue 02, 021002, (March 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.021002
KEYWORDS: Palladium, Signal detection, Inspection, Semiconducting wafers, Photomasks, Extreme ultraviolet, Defect detection, Wafer inspection, Printing, Reflectivity

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83221R (2012) https://doi.org/10.1117/12.916387
KEYWORDS: Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Inspection, Near field optics, EUV optics, Image analysis, Bridges, Phase shifts

Showing 5 of 27 publications
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