Dr. Yukiyasu Arisawa
at EUVL Infrastructure Development Ctr Inc
SPIE Involvement:
Author
Publications (27)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Defect detection, Data modeling, Inspection, 3D modeling, Atomic force microscopy, Photomasks, Extreme ultraviolet lithography, Geometrical optics, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Modulation, Surface roughness, 3D modeling, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Image processing, Inspection, Signal processing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics, Light

SPIE Journal Paper | March 1, 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Palladium, Signal detection, Inspection, Semiconducting wafers, Photomasks, Extreme ultraviolet, Defect detection, Wafer inspection, Printing, Reflectivity

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Inspection, Image analysis, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, EUV optics, Phase shifts, Near field optics

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Carbon, Multilayers, Light scattering, Inspection, 3D modeling, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Near field optics, Defect inspection

Showing 5 of 27 publications
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