Dr. Yulia Korobko
Sr. Litho Engineer (e-Beam) at IMO
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Reticles, Metrology, Image processing, Distortion, Image registration, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Overlay metrology

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Quartz, Chromium, Optical testing, Scanning electron microscopy, Photomasks, Neodymium, Tolerancing, Overlay metrology, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, Chromium, Spatial light modulators, Photomasks, Optical alignment, Critical dimension metrology, Neodymium

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Mirrors, Reticles, Metrology, Imaging systems, Interferometers, Calibration, Error analysis, Manufacturing, Photomasks

PROCEEDINGS ARTICLE | July 31, 2003
Proc. SPIE. 5052, Smart Structures and Materials 2003: Damping and Isolation
KEYWORDS: Mathematical modeling, Semiconductors, Electrodes, Particles, Dielectrics, Reliability, Magnetism, Solids, Epoxies, Surface finishing

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Reticles, Metrology, Mechanics, Sensors, Photography, Pellicles, Photomasks, Aluminum, Adhesives

Showing 5 of 10 publications
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