Yumi Nakajima
at Toshiba Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Semiconductors, Lithography, Lithographic illumination, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Reactive ion etching, Photoresist processing, Semiconducting wafers, Yield improvement

SPIE Journal Paper | 1 January 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

Proceedings Article | 27 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Diffraction, Optical lithography, Lithographic illumination, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 1 April 2010
JM3 Vol. 9 Issue 02
KEYWORDS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Silica, Etching, Metals, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Reactive ion etching, Photoresist processing, Semiconducting wafers

Showing 5 of 9 publications
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