Dr. Yunfei Deng
Staff Engineer at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (44)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Wafer-level optics, Data modeling, Scattering, Calibration, Printing, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data, Model-based design

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Data modeling, Calibration, Electrons, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Cadmium, Calibration, Etching, Diffusion, 3D modeling, Optical proximity correction, SRAF, Convolution, System on a chip, Systems modeling

Showing 5 of 44 publications
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