Yung-Feng Cheng
Manager at United Microelectronics Corp
SPIE Involvement:
Publications (24)

Proceedings Article | 26 May 2022 Poster + Paper
Proceedings Volume 12053, 120531T (2022)
KEYWORDS: Inspection, Semiconducting wafers, Wafer inspection, Image classification, Yield improvement, Defect inspection, Data analysis, Software development, Defect detection, Tolerancing

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11148, 111481H (2019)
KEYWORDS: Lithography, Photomasks, Process modeling, Optical proximity correction, Semiconducting wafers, Machine learning, Resolution enhancement technologies, Source mask optimization, Critical dimension metrology, Computer simulations

Proceedings Article | 27 June 2019 Paper
Proceedings Volume 11178, 111780Q (2019)
KEYWORDS: Photomasks, Optical proximity correction, Scanning electron microscopy, Optical calibration, Critical dimension metrology, Optical simulations, Bridges, Etching, Calibration, Wafer-level optics

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90522A (2014)
KEYWORDS: Photomasks, Semiconducting wafers, Bridges, Optical proximity correction, Metals, Printing, Scattering, Error analysis, Double patterning technology, Photoresist materials

Proceedings Article | 9 September 2013 Paper
Proceedings Volume 8880, 88801O (2013)
KEYWORDS: Image registration, Photomasks, Semiconducting wafers, Diffusion, Critical dimension metrology, Overlay metrology, Line width roughness, Lithography, Double patterning technology, Manganese

Showing 5 of 24 publications
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