Yung-Feng Cheng
Manager at United Microelectronics Corp
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Computer simulations, Photomasks, Machine learning, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling, Resolution enhancement technologies

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Wafer-level optics, Calibration, Etching, Scanning electron microscopy, Bridges, Photomasks, Optical simulations, Optical proximity correction, Critical dimension metrology, Optical calibration

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Scattering, Metals, Error analysis, Printing, Photoresist materials, Bridges, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Diffusion, Image registration, Photomasks, Line width roughness, Double patterning technology, Manganese, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Lithography, Metrology, Printing, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

Showing 5 of 23 publications
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