Mr. Yung-Sung Yen
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 19, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Optical lithography, Manufacturing, Inspection, Design for manufacturing, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Model-based design, Design for manufacturability

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Etching, Error analysis, Manufacturing, Inspection, Control systems, Software development, Photomasks, Semiconductor manufacturing, Critical dimension metrology

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