Yunqiang Zhang
Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Reticles, Optical lithography, Atrial fibrillation, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Lithium, Photomasks, Computational lithography, Optical proximity correction, SRAF, Chemical elements, 193nm lithography

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Logic, Optical lithography, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

Proceedings Article | 29 March 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Atrial fibrillation, Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Roads, Lithographic illumination, Detection and tracking algorithms, Image segmentation, Laser induced breakdown spectroscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Calibration, Control systems, Scanning electron microscopy, Process control, Photomasks, Optical simulations, Integrated optics, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 13 publications
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