Dr. Yuri Aksenov
at Philips Research Labs
SPIE Involvement:
Publications (8)

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61541H (2006) https://doi.org/10.1117/12.659345
KEYWORDS: Diffraction, Reticles, Photomasks, Binary data, Polarization, Signal attenuation, Chromium, Optical proximity correction, Printing, Phase shifts

Proceedings Article | 14 March 2006 Paper
Johannes van Wingerden, Laurent Le Cam, Rene Wientjes, Michael Benndorf, Yorick Trouiller, Jerome Belledent, Rob Morton, Yuri Aksenov
Proceedings Volume 6156, 61560O (2006) https://doi.org/10.1117/12.656359
KEYWORDS: Critical dimension metrology, Lithography, Logic, Scanners, Semiconductors, Transistors, Design for manufacturing, Group IV semiconductors, Optical proximity correction, Process control

Proceedings Article | 16 June 2005 Paper
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637271
KEYWORDS: Photomasks, Immersion lithography, Polarization, Atrial fibrillation, Lithography, Critical dimension metrology, Reticles, Semiconducting wafers, Diffraction, 193nm lithography

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597438
KEYWORDS: Diffraction, Photomasks, Polarization, Chromium, Binary data, Semiconducting wafers, Critical dimension metrology, Reticles, Optical proximity correction, Near field

Proceedings Article | 12 May 2005 Paper
Xiuhong Wei, H. Urbach, Arthur Wachters, Yuri Aksenov
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597732
KEYWORDS: Chromium, Photomasks, 3D modeling, Polarization, Binary data, Dielectric polarization, Finite element methods, Magnetism, Mathematical modeling, Maxwell's equations

Showing 5 of 8 publications
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