Dr. Yuri Aksenov
at Philips Research Labs
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Diffraction, Reticles, Polarization, Signal attenuation, Chromium, Printing, Photomasks, Optical proximity correction, Binary data, Phase shifts

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Lithography, Logic, Scanners, Process control, Design for manufacturing, Transistors, Optical proximity correction, Critical dimension metrology, Group IV semiconductors

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Diffraction, Reticles, Atrial fibrillation, Polarization, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Data modeling, Image processing, Scanners, Manufacturing, Electroluminescence, Design for manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Monochromatic aberrations, Point spread functions, Defect detection, Scattering, Particles, Scanning electron microscopy, Pellicles, Mie scattering, Immersion lithography, Liquids

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Refractive index, Phase shifting, Polarization, Spectroscopy, Silicon, Polarizers, Refraction, Photomasks, Binary data

Showing 5 of 8 publications
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