Dr. Yuri Aksenov
at Philips Research Labs
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Diffraction, Reticles, Polarization, Signal attenuation, Chromium, Printing, Photomasks, Optical proximity correction, Binary data, Phase shifts

Proceedings Article | 14 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Lithography, Logic, Scanners, Process control, Design for manufacturing, Transistors, Optical proximity correction, Critical dimension metrology, Group IV semiconductors

Proceedings Article | 16 June 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Diffraction, Reticles, Atrial fibrillation, Polarization, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Refractive index, Phase shifting, Polarization, Spectroscopy, Silicon, Polarizers, Refraction, Photomasks, Binary data

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Reticles, Polarization, Chromium, Near field, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data

Showing 5 of 8 publications
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