Yusuke Kasahara
at EUVL Infrastructure Development Ctr Inc
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Thin films, Lithography, Electron beam lithography, Data modeling, Image processing, Annealing, 3D modeling, Signal processing, Directed self assembly, Epitaxy

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymethylmethacrylate, Molecular bridges, Etching, Image processing, Bridges, Photomasks, Directed self assembly, Chemical analysis, Picosecond phenomena, Reactive ion etching

PROCEEDINGS ARTICLE | May 25, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Optical lithography, Data modeling, Scattering, Annealing, Materials processing, 3D modeling, Atomic force microscopy, Directed self assembly, Semiconductor manufacturing

PROCEEDINGS ARTICLE | April 4, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Annealing, Line width roughness, Directed self assembly, Chemical analysis, Epitaxy, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Electron beam lithography, Metrology, Optical lithography, Silica, Etching, Metals, Manufacturing, Scanning electron microscopy, Photomasks, Directed self assembly, Semiconductor manufacturing, Epitaxy, Reactive ion etching, Photoresist processing, Semiconducting wafers, Tin, Chemical mechanical planarization

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Etching, Polymers, Silicon, Electron microscopes, Transmission electron microscopy, Surface properties, Directed self assembly, Reactive ion etching, Molecular self-assembly

Showing 5 of 11 publications
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