Yusuke Shoji
at DNP America LLC
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 11, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Quartz, Air contamination, Ions, Nitrogen, Inspection, Solids, Adsorption, Photomasks, Laser damage threshold, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Quartz, Air contamination, Ions, Nitrogen, Inspection, Solids, Adsorption, Photomasks, Laser damage threshold, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Particles, Interfaces, Inspection, Solids, Photomasks, SRAF, Mask making, Cavitation, Acoustics, Device simulation

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Reticles, Crystals, Ions, Oxygen, Photomasks, Excimer lasers, Laser crystals, Semiconducting wafers, Chromatography

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