Dr. Yusuke Teramoto
R&D Unit 1 Leader at BLV Licht- und Vakuumtechnik GmbH
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | May 5, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Mirrors, Sputter deposition, Reliability, Laser development, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Plasma

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Ions, Reliability, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Plasma, Tin

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Reliability, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Feedback control, Ruthenium, Plasma, Tin

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Electrodes, Reliability, Inspection, Laser stabilization, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Electrodes, Particles, Ions, Laser development, Extreme ultraviolet, Extreme ultraviolet lithography, Atmospheric particles, Plasma, Liquids, Tin

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Contamination, Sputter deposition, Scanners, Particles, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Tin

Showing 5 of 14 publications
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