Yusuke Toda
at Toppan Photomasks
SPIE Involvement:
Publications (5)

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Opacity, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Signal detection, Defect inspection

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Defect detection, Polarization, Inspection, Optical inspection, Inspection equipment, Photomasks, Extreme ultraviolet, Semiconducting wafers, EUV optics, Defect inspection

Proceedings Article | 4 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electrons, Manufacturing, Inspection, Image resolution, Photomasks, Extreme ultraviolet, SRAF, Line edge roughness, EUV optics

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

Proceedings Article | 1 April 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Printing, Transmittance, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

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