Yuta Kanno
at Nissan Chemical Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Optical lithography, Etching, Diffusion, Materials processing, Manufacturing, Photomasks, Photoresist processing, Semiconducting wafers, System on a chip

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Sensors, Etching, Silicon, Reflectivity, Chromophores, Photoresist materials, Photomasks, Plasma etching, System on a chip

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