Yutaka Kodera
Engineer at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Opacity, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Signal detection, Defect inspection

Proceedings Article | 12 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Manufacturing, Reflectivity, Atomic force microscopy, Optical testing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Deep ultraviolet, Polarization, Opacity, Inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, EUV optics, Defect inspection

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Ultraviolet radiation, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

Showing 5 of 28 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (1)
Photomask Japan 2018
18 April 2018 | Yokohama, Japan
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