Yutaka Kodera
Engineer at Toppan Printing Co Ltd
SPIE Involvement:
Conference Co-Chair | Author
Publications (28)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Manufacturing, Reflectivity, Atomic force microscopy, Optical testing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Deep ultraviolet, Polarization, Opacity, Inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, EUV optics, Defect inspection

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Ultraviolet radiation, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Deep ultraviolet, Reflection, Imaging systems, Scanners, Manufacturing, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 28 publications
Conference Committee Involvement (1)
Photomask Japan 2018
18 April 2018 | Yokohama, Japan
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