Dr. Yuichiro Yamazaki
Manager at
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Publications (40)

SPIE Journal Paper | October 2, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Scatterometry, X-rays, Nondestructive evaluation, Scattering, Scanning electron microscopy, Semiconducting wafers, Etching, Scatter measurement, Silicon

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Scattering, X-rays, Silicon, Inspection, Nondestructive evaluation, Scatterometry, Semiconducting wafers, Scatter measurement, Signal detection

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Calibration, Image processing, Polarizers, Image analysis, Optical testing, Scatterometry, Data processing, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Defect detection, Particles, Inspection, Image acquisition, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Performance modeling, Systems modeling

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Signal to noise ratio, Sensors, Particles, Inspection, Image acquisition, Electron microscopes, Scanning electron microscopy, Optical inspection, Image quality, Extreme ultraviolet

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Particles, Inspection, Electron microscopes, Scanning electron microscopy, Optical inspection, Photomasks, Extreme ultraviolet, Prototyping, Defect inspection

Showing 5 of 40 publications
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