Yuuki Aritsuka
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (5)

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617290
KEYWORDS: Photomasks, Distortion, Charged-particle lithography, Electron beam direct write lithography, Silicon, Image analysis, Lithography, Metrology, Semiconducting wafers, Error analysis

Proceedings Article | 20 August 2004 Paper
Yuuki Aritsuka, Minoru Kitada, Masaru Kurosawa, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Hoga, Naoya Hayashi
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557777
KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Silicon, Electron beam lithography, Optical testing, Projection lithography, Oxides, Doping, Etching

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518034
KEYWORDS: Photomasks, Silicon, Etching, Scanning electron microscopy, Mask making, Optical lithography, Electron beam lithography, Image transmission, Metrology, Projection lithography

Proceedings Article | 28 August 2003 Paper
Yuuki Aritsuka, Yukio Iimura, Morihisa Hoga, Hisatake Sano
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504926
KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Manufacturing, Wafer bonding, Silicon carbide, Silicon, Electron beam lithography, Projection lithography, Ceramics

Proceedings Article | 1 August 2002 Paper
Hisatake Sano, Kenichi Morimoto, Yuuki Aritsuka, Hiroshi Fujita
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476995
KEYWORDS: Critical dimension metrology, Photomasks, Mask making, Projection lithography, Silicon, Data conversion, Electron beams, Electron beam lithography, Control systems, Lithography

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