Yuuki Aritsuka
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Metrology, Error analysis, Silicon, Distortion, Image analysis, Photomasks, Electron beam direct write lithography, Semiconducting wafers, Charged-particle lithography

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Oxides, Electron beam lithography, Etching, Silicon, Doping, Optical testing, Photomasks, Semiconducting wafers, Projection lithography, Charged-particle lithography

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Metrology, Optical lithography, Etching, Silicon, Scanning electron microscopy, Image transmission, Photomasks, Mask making, Projection lithography

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Electron beam lithography, Ceramics, Silicon, Manufacturing, Photomasks, Silicon carbide, Semiconducting wafers, Projection lithography, Charged-particle lithography, Wafer bonding

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Silicon, Control systems, Photomasks, Mask making, Critical dimension metrology, Data conversion, Projection lithography

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