Dr. Yuuki Ishii
at Nikon Corp
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Polymers, Scanners, Particles, Manufacturing, Inspection, Bridges, Immersion lithography, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Cooling systems, Lithography, Reticles, Scanners, Distortion, Semiconductor manufacturing, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Interferometers, Calibration, Scanners, Control systems, Distortion, Computer programming, Double patterning technology, Semiconducting wafers, Overlay metrology

Proceedings Article | 10 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Glasses, Scanners, Scanning electron microscopy, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 10 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Reticles, Metrology, Interferometers, Sensors, Computer programming, Servomechanisms, Artificial intelligence, Double patterning technology, Semiconducting wafers, Overlay metrology

Showing 5 of 28 publications
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