Yusuke Tanaka
Manager at SanDisk Ltd
SPIE Involvement:
Author
Publications (41)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Point spread functions, Electronics, Cadmium, Scattering, Scanners, Error analysis, Photomasks, Logic devices, Critical dimension metrology

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Photovoltaics, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Logic, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Electronic design automation, Model-based design

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Wafer-level optics, Lithography, Modulation, Control systems, Projection systems, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | April 1, 2011
JM3 Vol. 10 Issue 02
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Reflectivity, Deep ultraviolet, Lithography, Semiconducting wafers, Reticles, Visible radiation

SPIE Journal Paper | April 1, 2010
JM3 Vol. 9 Issue 02
KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Image processing, Multilayers, Photoresist processing, Photovoltaics, Lithography, Extreme ultraviolet, Coating

Showing 5 of 41 publications
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