Yusuke Tanaka
Manager at SanDisk Ltd
SPIE Involvement:
Author
Publications (43)

SPIE Journal Paper | 10 October 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Overlay metrology, Semiconducting wafers, Metals, Etching, Scanners, Optical filters, Extreme ultraviolet lithography, Data modeling, Metrology, Scanning electron microscopy

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Optical filters, Metrology, Etching, Metals, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Point spread functions, Electronics, Cadmium, Scattering, Scanners, Error analysis, Photomasks, Logic devices, Critical dimension metrology

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Photovoltaics, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers, Overlay metrology

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Logic, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Electronic design automation, Model-based design

Showing 5 of 43 publications
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