Dr. Yuval Bar
Advanced Metrology Development at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 28 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Cadmium, Data modeling, Etching, Metals, Image processing, 3D modeling, Optical proximity correction, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 25 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Etching, Dry etching, Manufacturing, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Process control, Plasma etching, Semiconducting wafers

Proceedings Article | 3 September 1999
Proc. SPIE. 3882, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing V
KEYWORDS: Oxides, Polishing, Metrology, Detection and tracking algorithms, Reflectivity, Control systems, Process control, Algorithm development, Semiconducting wafers, Chemical mechanical planarization

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top