Yuxin Tian
Assistant Lecturer
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Liquid phase epitaxy, Resistance, Capacitance, Photomasks, Critical dimension metrology, Semiconducting wafers, Process modeling, Device simulation

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