Dr. Yuyang Bian
at Shanghai Huali Integrated Circuit Corp.
SPIE Involvement:
Publications (7)

SPIE Journal Paper | 4 November 2022
JM3, Vol. 21, Issue 04, 041605, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041605
KEYWORDS: Etching, System on a chip, Image processing, Sensors, Lithography, Semiconducting wafers, Distance measurement, Process control, Transistors, Signal to noise ratio

SPIE Journal Paper | 19 September 2022
JM3, Vol. 21, Issue 03, 034001, (September 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.3.034001
KEYWORDS: Polarization, Diffraction gratings, Diffraction, Scanning electron microscopy, Overlay metrology, Etching, Metrology, Optical testing, Lithography, Image processing

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530D (2022) https://doi.org/10.1117/12.2614221
KEYWORDS: Overlay metrology, Double patterning technology, Edge roughness, Scanning electron microscopy, Manufacturing, Line width roughness, Line edge roughness, Integrated circuits, Electron microscopy, Critical dimension metrology

Proceedings Article | 26 May 2022 Poster + Presentation + Paper
Wen Zhan Zhou, Kan Zhou, Yu Yang Bian, Yu Zhang, Ijen van Mil, Robbin Zhu, Jo Zhu, Ivan Mao, Kai yuan Chi, Xuechen Zhu, Kelvin Pao, Pei Wang, Lilla Wang, Abdalmohsen Elmalk, Gary Zhang
Proceedings Volume 12053, 120532A (2022) https://doi.org/10.1117/12.2638430
KEYWORDS: Metrology, Semiconducting wafers, Control systems, Optical proximity correction, Logic devices, Reticles, Stochastic processes, High volume manufacturing, Finite element methods, Error analysis

Proceedings Article | 19 August 2021 Presentation + Paper
Yu Zhang, Biqiu Liu, Cong Zhang, Yuyang Bian, Song Gao, Yifei Zhu, Xiaobo Guo, Jun Huang, Yaniv Abramovitz, Qiang Zhou, Uri Smolyan, Omri Baum, Shmuel Ben Nissim, Alexander Vipolzov
Proceedings Volume 11611, 116111X (2021) https://doi.org/10.1117/12.2585391
KEYWORDS: Overlay metrology, Instrument modeling, Semiconducting wafers, Measurement devices, Wafer-level optics, Mathematical modeling, Yield improvement, Etching, Optical testing, Data modeling

Showing 5 of 7 publications
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