Yves T. LaPlanche
at STMicroelectronics
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Control systems, Photomasks, Optical alignment, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Scanners, Chemistry, Photomasks, CMOS technology, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Optical lithography, Scanners, Error analysis, Distortion, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Electron beam lithography, Etching, Polymers, Diffusion, Palladium, Critical dimension metrology, Semiconducting wafers, Prototyping, Industrial chemicals

PROCEEDINGS ARTICLE | July 1, 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Manufacturing, Photomasks, Photoresist processing, Semiconducting wafers, Prototyping, Standards development

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