Yves Fabien Rody
Technical Reticle Expert at NXP Semiconductors
SPIE Involvement:
Publications (27)

Proceedings Article | 16 November 2007 Paper
Mazen Saied, Franck Foussadier, Jérôme Belledent, Yorick Trouiller, Isabelle Schanen, Emek Yesilada, Christian Gardin, Jean Christophe Urbani, Frank Sundermann, Frédéric Robert, Christophe Couderc, Florent Vautrin, Laurent LeCam, Gurwan Kerrien, Jonathan Planchot, Catherine Martinelli, Bill Wilkinson, Yves Rody, Amandine Borjon, Nicolo Morgana, Jean-Luc Di-Maria, Vincent Farys
Proceedings Volume 6730, 673050 (2007) https://doi.org/10.1117/12.752613
KEYWORDS: Photomasks, Optical proximity correction, 3D modeling, Semiconducting wafers, Diffraction, Scattering, Near field, Lithographic illumination, Systems modeling, Near field optics

Proceedings Article | 14 May 2007 Paper
Proceedings Volume 6607, 66071C (2007) https://doi.org/10.1117/12.728960
KEYWORDS: SRAF, Optical proximity correction, Printing, Optical lithography, Silicon, Photomasks, Semiconducting wafers, Inspection, Optical simulations, Lithography

Proceedings Article | 3 May 2007 Paper
Frank Sundermann, Yorick Trouiller, Jean-Christophe Urbani, Christophe Couderc, Jérôme Belledent, Amandine Borjon, Franck Foussadier, Christian Gardin, Laurent LeCam, Yves Rody, Mazen Saied, Emek Yesilada, Catherine Martinelli, Bill Wilkinson, Florent Vautrin, Nicolo Morgana, Frederic Robert, Patrick Montgomery, Gurwan Kerrien, Jonathan Planchot, Vincent Farys, Jean-Luc Di Maria
Proceedings Volume 6533, 65330E (2007) https://doi.org/10.1117/12.736927
KEYWORDS: Optical proximity correction, Reticles, Metals, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Metrology, Manufacturing, Cadmium, Semiconductors

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65201D (2007) https://doi.org/10.1117/12.714116
KEYWORDS: Optical lithography, Polarization, Transistors, Double patterning technology, Resolution enhancement technologies, Printing, System on a chip, Logic, Scanners, Optical proximity correction

Proceedings Article | 27 March 2007 Paper
M. Saied, F. Foussadier, J. Belledent, Y. Trouiller, I. Schanen, C. Gardin, J. C. Urbani, P. K. Montgomery, F. Sundermann, F. Robert, C. Couderc, F. Vautrin, G. Kerrien, J. Planchot, E. Yesilada, C. Martinelli, B. Wilkinson, A. Borjon, L. Le-Cam, J. L. Di-Maria, Y. Rody, N. Morgana, Vincent Farys
Proceedings Volume 6520, 65204Q (2007) https://doi.org/10.1117/12.715120
KEYWORDS: 3D modeling, Photomasks, Optical proximity correction, Polarization, Process modeling, Lithium, Optical lithography, Information technology, Semiconducting wafers, Semiconductors

Showing 5 of 27 publications
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