Dr. Yvon Chai
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Optical signal processing, Image processing, Optical metrology, Signal processing, Machine learning, Semiconducting wafers, Optics manufacturing, Overlay metrology

Proceedings Article | 13 March 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Etching, Manufacturing, Inspection, Control systems, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Reticles, Metrology, Optical lithography, Etching, Scanners, Control systems, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Etching, Image processing, Inspection, Control systems, Scatterometry, Process control, Measurement devices, Critical dimension metrology, Semiconducting wafers, Scatter measurement

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