Dr. Mark Ma
Engineer at Photronics Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Cadmium, Defect detection, Detection and tracking algorithms, Opacity, Argon, Inspection, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Opacity, Etching, Quartz, Image processing, Atomic force microscopy, Attenuators, Process control, Photomasks, Analytical research, Critical dimension metrology

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Lithographic illumination, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Phase shifts

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Reticles, Contamination, Crystals, Ions, Inspection, Raman spectroscopy, Photomasks, Chemical analysis, Fluorine

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Reticles, Statistical analysis, Data modeling, Crystals, Inspection, Photomasks, Semiconducting wafers, Failure analysis, 193nm lithography

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Reticles, Contamination, Air contamination, Crystals, Ions, Manufacturing, Inspection, Photomasks, Chemical analysis, Fluorine

Showing 5 of 15 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top