Zachary Bogusz
Research Scientist at EMD Performance Materials Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Image processing, Dielectrics, Coating, Photoresist materials, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Electron beam lithography, Contamination, Etching, Polymers, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Gold, Polymers, Copper, Silicon, Coating, Chemistry, Fourier transforms, Plating, Photoresist processing, Semiconducting wafers

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