Zachary Bogusz
Research Scientist at EMD Performance Materials Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Dielectrics, Lithography, Semiconducting wafers, Critical dimension metrology, Polymers, Photoresist materials, Image processing, Coating, Semiconductor manufacturing, Photoresist developing

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Extreme ultraviolet, Electron beam lithography, Extreme ultraviolet lithography, Absorption, Line width roughness, Semiconducting wafers, Lithography, Polymers, Etching, Contamination

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Copper, Silicon, Coating, Photoresist processing, Gold, Fourier transforms, Plating, Chemistry, Semiconducting wafers

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