Zack Huang
at Photronics DNP Semiconductor Mask Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Contamination, Etching, Dry etching, Particles, Inspection, Chromium, Scanning electron microscopy, Photomasks, Chlorine, Plasma

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top