Dr. Zdenek Benes
at Ecole Polytechnique Fédérale de Lausanne
SPIE Involvement:
Publications (6)

SPIE Journal Paper | 25 January 2018
JNP, Vol. 12, Issue 01, 016004, (January 2018) https://doi.org/10.1117/12.10.1117/1.JNP.12.016004
KEYWORDS: Beam steering, Waveguides, Confocal microscopy, Optical filters, Light, Cameras, Electron beams, Transparency, Mirrors, Optical design

Proceedings Article | 30 March 2010 Paper
Linda Sundberg, Gregory Wallraff, Alexander Friz, Amy Zweber, Zdenek Benes, Robert Lovchik, Emmanuel Delamarche, William Hinsberg
Proceedings Volume 7639, 76392S (2010) https://doi.org/10.1117/12.849145
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Liquids, Silicon, Ions, Reactive ion etching, Wafer-level optics, Plasma, Photoresist developing, Optical lithography

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72730K (2009) https://doi.org/10.1117/12.816048
KEYWORDS: Photoresist materials, Line edge roughness, Photomasks, Etching, Photoresist developing, Chromium, Resistance, Interfaces, Thin film coatings, Metrology

Proceedings Article | 1 November 2007 Paper
Proceedings Volume 6730, 67304A (2007) https://doi.org/10.1117/12.747599
KEYWORDS: Etching, Critical dimension metrology, Photomasks, Photoresist processing, Cadmium, Modulation, Coating, Plasma etching, Materials processing, Reticles

Proceedings Article | 20 October 2006 Paper
Daniel Sullivan, Yusuke Okawa, Kazuhiko Sugawara, Zdenek Benes, Jun Kotani
Proceedings Volume 6349, 634905 (2006) https://doi.org/10.1117/12.686732
KEYWORDS: Photomasks, Modulation, Manufacturing, Chemically amplified resists, Industrial chemicals, Photoresist materials, Critical dimension metrology, Reactive ion etching, Photoresist processing, Standards development

Showing 5 of 6 publications
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