Dr. Zdenek Benes
at Ecole Polytechnique Fédérale de Lausanne
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | January 25, 2018
JNP Vol. 12 Issue 01
KEYWORDS: Beam steering, Waveguides, Confocal microscopy, Optical filters, Light, Cameras, Electron beams, Transparency, Mirrors, Optical design

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Wafer-level optics, Optical lithography, Ions, Silicon, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Photoresist developing, Plasma, Liquids

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Metrology, Etching, Interfaces, Resistance, Chromium, Photoresist materials, Photomasks, Line edge roughness, Thin film coatings, Photoresist developing

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Reticles, Cadmium, Modulation, Etching, Coating, Materials processing, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Modulation, Manufacturing, Photoresist materials, Photomasks, Critical dimension metrology, Reactive ion etching, Photoresist processing, Standards development, Industrial chemicals, Chemically amplified resists

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Electron beams, Cadmium, Quartz, Scanning electron microscopy, Photomasks, Beam shaping, Mask making, Critical dimension metrology, Chemically amplified resists

Showing 5 of 6 publications
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