ZeXi Deng
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Human-machine interfaces, Error analysis, Computer programming, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Graphic design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Optical lithography, Metals, Silicon, Manufacturing, Electroluminescence, Semiconductor manufacturing, Image classification, Failure analysis, Library classification systems

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Phase modulation, Visualization, Databases, Metals, Manufacturing, Bridges, Design for manufacturing, Optical proximity correction, Electronic design automation

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Data modeling, Calibration, Metals, Image processing, Manufacturing, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling, Design for manufacturability

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Printing, Optical proximity correction, SRAF, Semiconducting wafers, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Optical lithography, Data modeling, Physics, Data processing, Photomasks, Optical proximity correction, Line edge roughness, Semiconducting wafers, Model-based design, Process modeling

Showing 5 of 8 publications
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