Zheng Tao
at imec
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Optical lithography, Fin field effect transistors, Etching, Dry etching, Gallium arsenide, Silicon, Field effect transistors, Plasma etching, Front end of line, Nanowires

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Silicon, Photoresist materials, Photomasks, System on a chip, Front end of line

Proceedings Article | 11 April 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Etching, Image processing, Silicon, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 23 March 2016 Paper
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Optical lithography, Etching, Metals, Germanium, Dielectrics, Silicon, Field effect transistors, Isotropic etching, Nanowires

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Capillaries, Image processing, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing, Liquids

Showing 5 of 8 publications
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