Zhengguo Tian
at YMTC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Optical alignment, Diffraction, Semiconducting wafers, Structural design, Overlay metrology, Optical design, Diffraction gratings, Interfaces, Process control, Manufacturing, Scanners, Oxides, Lithography, Absorption

SPIE Journal Paper | 23 November 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Electroluminescence, Source mask optimization, Photomasks, Optical proximity correction, Computational lithography, Diffractive optical elements, Metals, Lithography, Manufacturing, Optimization (mathematics)

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