Zhengkai Yang
at SHANGHAI Huali Microelectronics Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Data modeling, Scanners, Photomasks, Optical simulations, Immersion lithography, Optical proximity correction, Critical dimension metrology, Photoresist processing, Performance modeling

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