Zhian Guo
at KLA Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 748807 (2009) https://doi.org/10.1117/12.830668
KEYWORDS: Photomasks, Inspection, Source mask optimization, Semiconducting wafers, Lithography, Manufacturing, Binary data, Reticles, Image processing, Image resolution

Proceedings Article | 2 June 2003 Paper
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.504577
KEYWORDS: Inspection, Reticles, Defect detection, Critical dimension metrology, Semiconducting wafers, Image segmentation, Lithography, Detection and tracking algorithms, Defect inspection, Algorithm development

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468207
KEYWORDS: Inspection, Reticles, Defect detection, Semiconducting wafers, Critical dimension metrology, Photomasks, Lithography, Defect inspection, Databases, Algorithm development

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