Zhigang Mao
Process Engineer at Applied Materials Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Contamination, Atmospheric plasma, Phase modulation, Etching, Spectroscopy, Chromium, Oxygen, Photomasks, Chlorine, Plasma

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Etching, Quartz, Particles, Chemistry, Chromium, Photoresist materials, Photomasks, Plasma etching, Critical dimension metrology, Plasma

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