Dr. Zhih-Yu Pan
at Taiwan Semiconductor Mfg Co
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 17, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Photons, Extreme ultraviolet, Quantum physics, Extreme ultraviolet lithography, Raster graphics, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Phase shifting, Optical lithography, Etching, Quartz, Photomasks, Mask making, Semiconducting wafers, Photomask technology, Phase shifts

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top