Dr. Zhih-Yu Pan
at Taiwan Semiconductor Mfg Co
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 17 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Electron beam lithography, Deep ultraviolet, Lithography, Extreme ultraviolet lithography, Raster graphics, Quantum physics, Photons, Semiconducting wafers

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Semiconducting wafers, Phase shifting, Phase shifts, Photomask technology, Optical lithography, Quartz, Etching, Mask making

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