Dr. Zhijian Lu Profile

Dr. Zhijian Lu

Marketing Manager at DuPont Electronics & Industrial

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Author

Publications (10)

Proceedings Article | 27 March 2007 Paper

Process window and interlayer aware OPC for the 32-nm node

Mark Terry, Gary Zhang, George Lu, Simon Chang, Tom Aton, Robert Soper, Mark Mason, Shane Best, Bill Dostalik, Stefan Hunsche, Jiang Wei Li, Rongchun Zhou, Mu Feng, Jim Burdorf

Proceedings Volume 6520, 65200S (2007) https://doi.org/10.1117/12.714442

KEYWORDS: Optical proximity correction, Metals, Photomasks, Model-based design, SRAF, Tolerancing, Critical dimension metrology, Lithography, Data modeling, Performance modeling

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Proceedings Article | 14 March 2006 Paper

Challenges and solutions for trench lithography beyond 65nm node

Zhijian Lu, Chi-Chien Ho, Mark Mason, Andrew Anderson, Randy Mckee, Ricky Jackson, Cynthia Zhu, Mark Terry

Proceedings Volume 6156, 615617 (2006) https://doi.org/10.1117/12.659242

KEYWORDS: Optical proximity correction, Metals, Model-based design, Design for manufacturing, Lithography, Process modeling, Reticles, Semiconducting wafers, Resolution enhancement technologies, Optimization (mathematics)

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Proceedings Article | 14 September 2001 Paper

When is bilayer thin-film imaging suitable: comparison with single-layer resists

Scott Halle, Alan Thomas, Michael Armacost, Timothy Dalton, Xiaochun Chen, Scott Bukofsky, Oliver Genz, Zhijian Lu, Shahid Butt, Zheng Chen, Richard Ferguson, Eric Coker, Robert Leidy, Qinghuang Lin, Arpan Mahorowala, Katherina Babich, Karen Petrillo, Marie Angelopoulos, Mark Ignatowicz, Bang Bui

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435797

KEYWORDS: Etching, Photomasks, Dielectrics, Lithography, Oxides, Thin films, Silicon, Reactive ion etching, Photoresist processing, Scanning electron microscopy

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Proceedings Article | 22 August 2001 Paper

Optimization of segmented alignment marks for advanced semidonductor fabrication processes

Qiang Wu, Zhijian Lu, Gary Williams, Franz Zach, Bernhard Liegl

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436746

KEYWORDS: Optical alignment, Image segmentation, Silicon, Scattering, Light scattering, Metals, Lithography, Computer simulations, Semiconductors, Tolerancing

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Proceedings Article | 5 July 2000 Paper

Sensitivity of coma monitors to resist processes

Christian Summerer, Zhijian Lu

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388961

KEYWORDS: Monochromatic aberrations, Photoresist processing, Overlay metrology, Wavefront aberrations, Diffusion, Critical dimension metrology, Semiconductor manufacturing, Optical lithography, Zernike polynomials, Lithography

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Proceedings Article | 5 July 2000 Paper

Double exposure technique to reduce line shortening and improve pattern fidelity

Gerhard Kunkel, Scott Bukofsky, Shahid Butt, Zhijian Lu

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388943

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Double patterning technology, Resolution enhancement technologies, Diffraction, Light sources, Manufacturing, Lithographic illumination, Image processing

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Proceedings Article | 23 June 2000 Paper

Defect printing issues with high-contrast chemically amplified resists

Zhijian Lu, Wayne Moreau, Xiaoming Yin, K. Rex Chen, Alan Thomas, Peggy Lawson, George Jordhamo, ChungHsi Wu

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388284

KEYWORDS: Polymers, Printing, Semiconducting wafers, Floods, Photomasks, Chemically amplified resists, Etching, Inspection, Sulfur, Microelectronics

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Proceedings Article | 2 June 2000 Paper

Subwavelength alignment mark signal analysis of advanced memory products

Xiaoming Yin, Alfred Wong, Donald Wheeler, Gary Williams, Eric Lehner, Franz Zach, Byeong Kim, Yuzo Fukuzaki, Zhijian Lu, Santo Credendino, Timothy Wiltshire

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386501

KEYWORDS: Optical alignment, Silicon, Silicon films, Polarization, Signal processing, Sensors, Signal analysis, Semiconducting wafers, Microelectronics, Semiconductors

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Proceedings Article | 11 June 1999 Paper

Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography

Zhijian Lu, Yuping Cui, Alan Thomas, Scott Mansfield, Gerhard Kunkel, David Dobuzinsky, Franz Zach, Daniel Liu, K. Rex Chen, George Jordhamo, Alois Gutmann, Timothy Farrell

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350280

KEYWORDS: Printing, Etching, Photomasks, Oxides, Phase shifts, Lithography, Optical lithography, Optical properties, Electroluminescence, Resistance

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Proceedings Article | 7 July 1997 Paper

Challenge of 1-Gb DRAM development when using optical lithography

Timothy Farrell, Ronald Nunes, Donald Samuels, Alan Thomas, Richard Ferguson, Antoinette Molless, Alfred Wong, Will Conley, Donald Wheeler, Santo Credendino, Munir Naeem, Peter Hoh, Zhijian Lu

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275974

KEYWORDS: Lithography, Optical lithography, Optics manufacturing, Photoresist processing, Photomasks, Software development, Semiconductors, Prototyping, Manufacturing, Lithographic illumination

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Showing 5 of 10 publications

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