Dr. Zhijie Deng
at Synopsys Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Calibration, Control systems, Scanning electron microscopy, Process control, Photomasks, Optical simulations, Integrated optics, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Finite-difference time-domain method, Modulation, Polarization, 3D modeling, Photomasks, Optical proximity correction, Process modeling, Resolution enhancement technologies, Maxwell's equations

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Atrial fibrillation, 3D modeling, Near field, 3D metrology, Photomasks, Optical proximity correction, TCAD, Performance modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6130, Advanced Optical and Quantum Memories and Computing III
KEYWORDS: Refractive index, Prisms, Slow light, Optical amplifiers, Crystals, Distortion, Laser crystals, Signal detection, Electromagnetism, Two wave mixing

PROCEEDINGS ARTICLE | May 23, 2005
Proc. SPIE. 5842, Fluctuations and Noise in Photonics and Quantum Optics III
KEYWORDS: Diffraction, Cameras, Sensors, Calibration, CCD cameras, Computer generated holography, Neural networks, Binary data, Content addressable memory, Neurons

PROCEEDINGS ARTICLE | May 23, 2005
Proc. SPIE. 5842, Fluctuations and Noise in Photonics and Quantum Optics III
KEYWORDS: Refractive index, Slow light, Transparency, Crystals, Photonic crystals, Distortion, Solids, Laser crystals, Signal detection, Two wave mixing

Showing 5 of 9 publications
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