A novel process that combines interference lithography and ion beam etching is presented for fabrication of magnetic
submicron structures and nanostructures in this paper. Instead of an antireflective coating, vertical standing wave
patterns were removed using oxygen descumming process. A series of magnetic submicronmeter structures were
fabricated on Co<sub>0.9</sub>Fe<sub>0.1</sub> films by this technique. Fabrication of magnetic nanostructures was performed by using a high
exposure dose and modifications in optimized development conditions. A thin Au film was deposited on the sidewall of
the magnetic nanostructures to avoid the oxidation of Co and Fe. The effect of this method was confirmed by X-ray
photoelectron spectroscopy (XPS). Hysteresis loops measured by a highly sensitive superconducting quantum
interference device (SQUID) technique show the different magnetic properties of the magnetic patterns with different
We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined
with UV curing. The bilayer process using PMMA as sacrificial layer was developed to release the SU-8 layer to form
three dimensional structures. The SU-8 displays excellent imprint property and well defined patterns are achieved at at
low temperature, low pressure after demolding process. Using this technology, 300nm period SU-8 subwavelengh
gratings and nanochannels were fabricated on flat substrate with good fidelity. This sacrificial layer-assisted UV curing
imprint technology offers versatility and flexibility to stack polymer layers and sealed fluidic channels.
Magnetic submicron meter structures were fabricated on Co<sub>0.9</sub>Fe<sub>0.1</sub> films by laser interference lithography combined with
ion beam etching. The vertical standing wave was restrained by using proper exposure dose and appropriate development
time. Hysteresis loops of the magnetic film and magnetic patterns were presented by surface magneto-optical Kerr effect.
The difference magnetism between magnetic patterns with different critical sizes and the film was discussed.