This paper presents an approach used to fabricate resonant subwavelength grating based on thiol-ene material. First of all, polydimethylsiloxane soft imprint stamp with opposite structure of the subwavelength grating master mold is made by casting. Then, the desired subwavelength grating with UV-curable thiol-ene material grating structure is fabricated using the polydimethylsioxane soft stamp by UV-curable soft-lithography. Here, we fabricate a subwavelength grating with period of 300nm using the approach, which could reflect blue light with wavelength ranging from 448nm to 482nm at a specific angle and presents the excellent resonant characteristic. The experimental results are consistent with the simulation results, demonstrating that the approach proposed in this paper could effectively fabricate the thiol-ene material resonant subwavelength grating structure. The thiol-ene material is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. The fabrication technique in this paper is simple, low-cost, and easy to high throughput, which has broad application prospects in the preparation of micro and nano structures.
Polymer optical elements have widely been investigated because of their low cost and simple fabrication. Currently, UV-curable epoxy resins have been become general polymer materials for optical elements. However, they are still limited by their intrinsic properties, such as a relatively low rate of polymerization and high formulation viscosity. This paper proposed and demonstrated a rapid UV-curable process for polymer optical elements fabrication based on a UV-curable and low-viscosity thiol-ene composition. Several optical elements, including one-dimensional gratings with a 10-um period, Dammann Gratings and microlens arrays (100μm lens diameter), were fabricated by the UV-curable thiol-ene composition and their optical properties were examined in detail.
High performance infrared polarizer with broad band is required for various infrared applications. The conventional infrared polarizer, based on the birefringence effect of natural crystal, is cost-consuming in fabrication and can hardly be integrated into micro-optical systems due to its large bulk. In this paper, an infrared polarizer is proposed in the spectrum from 3 to 19 μm based on sub-wavelength metal wire grid. The dependence of the performance on some key parameters, including metal materials, geometrical parameters, has been deeply investigated by using the Finite-Difference Time-Domain (FDTD) method. The results show that Au wire-grids have a higher transmittance for the Transverse Magnetic（TM） mode light than that of other metal materials, and both the grid period and the grid thickness have important impact on the performance. Based on these observations, a polarizer has been designed by choosing the optimal value of related parameters. Numerical simulation suggests that the designed infrared wire grid polarizer have advantages of broad band, high TM polarization transmission efficiencies and high extinction ratios. The transmission efficiencies of TM polarization are larger than 59.3%, and the extinction ratios range from 28.6 to 44.6 dB in that range of the spectrum.