Zhiyang Song
Librarian at Institute of Microelectronics of the Cas
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 20 December 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Photoresist processing, Photomasks, Critical dimension metrology, Lithography, Semiconducting wafers, Electroluminescence, Process modeling, Optimization (mathematics), Refractive index, Binary data

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Diffraction, Opacity, Scanners, Projection systems, Microelectronics, Photomasks, Immersion lithography, Phase shifts, Diffraction gratings

SPIE Journal Paper | 23 November 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Electroluminescence, Source mask optimization, Photomasks, Optical proximity correction, Computational lithography, Diffractive optical elements, Metals, Lithography, Manufacturing, Optimization (mathematics)

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Opacity, Electroluminescence, Photomasks, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Phase shifts

SPIE Journal Paper | 3 November 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Optical proximity correction, Metals, Photomasks, Algorithm development, Semiconducting wafers, Binary data, Image processing, Resolution enhancement technologies, Optical lithography, SRAF

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