Zhiyong Yang
at Shanghai Micro Electronics Equipment Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Optical components, Lithography, Reticles, Image processing, Image quality, Artificial intelligence, Nanoimprint lithography, Semiconducting wafers, Performance modeling, Process modeling

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Reticles, Calibration, Image processing, Scanners, Error analysis, Image quality, Image sensors, Optical alignment, Semiconducting wafers

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Statistical analysis, Scanners, Error analysis, Diagnostics, Data processing, Finite element methods, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 11 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Sensors, Image processing, Image acquisition, Wavefronts, Image sensors, Photomasks, Semiconducting wafers, Process modeling, Fiber optic illuminators

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Mathematical modeling, Lithography, Mirrors, Image processing, Inspection, Wavefronts, Image quality, Critical dimension metrology, Performance modeling, Process modeling

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