Mr. Mike Xiang
Development Engineer at JSR Micro
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Etching, Polymers, Coating, Reflectivity, Scanning electron microscopy, Chromophores, Immersion lithography, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | April 6, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Signal attenuation, Etching, Reflectivity, Chemical vapor deposition, Control systems, Photomasks, Immersion lithography, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Etching, Polymers, Ions, Gases, Chemistry, Oxygen, Photoresist materials, Reactive ion etching, Semiconducting wafers, Anisotropic etching

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Refractive index, Optical lithography, Etching, Polymers, Fourier transforms, Scanning electron microscopy, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Semiconductors, Lithography, Refractive index, Polymers, Reflectivity, Scanning electron microscopy, Chromophores, Line edge roughness, Photoresist processing, 193nm lithography

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Etching, Polymers, Coating, Reflectivity, Fourier transforms, Silicon carbide, Neodymium, 193nm lithography, Bottom antireflective coatings

Showing 5 of 7 publications
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