Dr. Ziyang Wang
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 2 May 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Diffraction, Reticles, Optical lithography, Lithographic illumination, Printing, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Diffraction, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Image contrast enhancement, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Diffraction, Photomasks, Extreme ultraviolet, Artificial intelligence, Extreme ultraviolet lithography, Source mask optimization, SRAF, Critical dimension metrology, Photomicroscopy, 3D image processing

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top