Dr. Zongchang Yu
CEO at
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Metrology, Data modeling, Calibration, Scanners, Printing, Photomasks, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Diffractive optical elements, Cadmium, Data modeling, Birefringence, Scanners, Computational lithography, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Metrology, Cadmium, Data modeling, Calibration, Scanners, Control systems, Computer simulations, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Scanners, Optical simulations, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Performance modeling

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Sensors, Metals, Inspection, Computer simulations, Feature extraction, Printing, Artificial intelligence, Optical proximity correction, Tolerancing, Evolutionary algorithms

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Inspection, Computer simulations, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 10 publications
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